Electrically Active Defects in SiC Power MOSFETs
نویسندگان
چکیده
The performance and reliability of the state-of-the-art power 4H-SiC metal–oxide–semiconductor field-effect transistors (MOSFETs) are affected by electrically active defects at near interface between SiC gate dielectric. Specifically, these impact channel-carrier mobility threshold voltage MOSFETs, depending on their physical location energy levels. To characterize defects, techniques have evolved from those used for Si devices to exclusively designed MOS structure MOSFETs. This paper reviews dielectric in MOSFETs capacitors. First, classified according locations positions into (1) traps, (2) traps with levels aligned gap, (3) near-interface conduction band SiC. Then, representative published results shown discussed each class defect.
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ژورنال
عنوان ژورنال: Energies
سال: 2023
ISSN: ['1996-1073']
DOI: https://doi.org/10.3390/en16041771